Product details:
ISBN13: | 9780443314629 |
ISBN10: | 0443314624 |
Binding: | Hardback |
No. of pages: | 232 pages |
Size: | 229x152 mm |
Language: | English |
700 |
Category:
Digital signal, audio and image processing
Electrical engineering and telecommunications, precision engineering
Electricity, magnetism science
Further readings in the field of technology
Mechanical Engineering Sciences
Further readings in the field of technology (charity campaign)
Mechanical Engineering Sciences (charity campaign)
Electricity, magnetism science (charity campaign)
Electrical engineering and telecommunications, precision engineering (charity campaign)
Digital signal, audio and image processing (charity campaign)
Nanolithography and Surface Microscopy with Electron Beams
Series:
Advances in Imaging and Electron Physics;
231;
Publisher: Academic Press
Date of Publication: 1 August 2024
Normal price:
Publisher's listprice:
EUR 175.00
EUR 175.00
Your price:
57 771 (55 020 HUF + 5% VAT )
discount is: 20% (approx 14 443 HUF off)
Discount is valid until: 30 June 2024
The discount is only available for 'Alert of Favourite Topics' newsletter recipients.
Click here to subscribe.
Click here to subscribe.
Availability:
Not yet published.
Long description:
Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary.
- Provides the authority and expertise of leading contributors from an international board of authors
- Presents the latest release in the Advances in Imaging and Electron Physics series
Table of Contents:
Introduction and Summary
Lord Broers
1. Early life
Lord Broers
2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
Lord Broers
3. Formation of cones and ridges on ion-etched surfaces
Lord Broers
4. Microfabrication in an SEM
Lord Broers
5. High Resolution Short Focal Length Lens Electron Probe
Lord Broers
6. Low-Loss Surface Microscopy in short focal length Probe
Lord Broers
7. Microfabrication in the 5? electron probe
Lord Broers
8. Nanodevices fabricated in the HR Probe
Lord Broers
9. Fabrication of Structures with Dimensions Below 10 nm
Lord Broers
10. Semiconductor Lithography and Processing
Lord Broers
11. Nanolithography at 400kV
Lord Broers
12. Last twenty years and future of semiconductor chips
Lord Broers
Lord Broers
1. Early life
Lord Broers
2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
Lord Broers
3. Formation of cones and ridges on ion-etched surfaces
Lord Broers
4. Microfabrication in an SEM
Lord Broers
5. High Resolution Short Focal Length Lens Electron Probe
Lord Broers
6. Low-Loss Surface Microscopy in short focal length Probe
Lord Broers
7. Microfabrication in the 5? electron probe
Lord Broers
8. Nanodevices fabricated in the HR Probe
Lord Broers
9. Fabrication of Structures with Dimensions Below 10 nm
Lord Broers
10. Semiconductor Lithography and Processing
Lord Broers
11. Nanolithography at 400kV
Lord Broers
12. Last twenty years and future of semiconductor chips
Lord Broers