Nanolithography and Surface Microscopy with Electron Beams
Series: Advances in Imaging and Electron Physics; 231;
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Product details:
- Publisher Academic Press
- Date of Publication 30 October 2024
- ISBN 9780443314629
- Binding Hardback
- No. of pages406 pages
- Size 228x152 mm
- Weight 790 g
- Language English 616
Categories
Long description:
Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary.
MoreTable of Contents:
Introduction and Summary
Lord Broers
1. Early life
Lord Broers
2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
Lord Broers
3. Formation of cones and ridges on ion-etched surfaces
Lord Broers
4. Microfabrication in an SEM
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5. High Resolution Short Focal Length Lens Electron Probe
Lord Broers
6. Low-Loss Surface Microscopy in short focal length Probe
Lord Broers
7. Microfabrication in the 5Å electron probe
Lord Broers
8. Nanodevices fabricated in the HR Probe
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9. Fabrication of Structures with Dimensions Below 10 nm
Lord Broers
10. Semiconductor Lithography and Processing
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11. Nanolithography at 400kV
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12. Last twenty years and future of semiconductor chips
Lord Broers
