Industrial Plasma Engineering
Volume 2: Applications to Nonthermal Plasma Processing
Series: Industrial Plasma Engineering; 2;
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126 525 Ft
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Estimated delivery time: In stock at the publisher, but not at Prospero's office. Delivery time approx. 3-5 weeks.
Not in stock at Prospero.
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Delivery time is estimated on our previous experiences. We give estimations only, because we order from outside Hungary, and the delivery time mainly depends on how quickly the publisher supplies the book. Faster or slower deliveries both happen, but we do our best to supply as quickly as possible.
Product details:
- Edition number 1
- Publisher CRC Press
- Date of Publication 25 August 2001
- ISBN 9780750305440
- Binding Hardback
- No. of pages658 pages
- Size 234x156 mm
- Weight 1247 g
- Language English 0
Categories
Short description:
Written by a leading expert in the field, Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low-temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices tha
MoreLong description:
Written by a leading expert in the field, Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.
MoreTable of Contents:
Surface Interactions in Plasma Processing. Atmospheric Pressure Plasma Sources. Vacuum Plasma Sources. Plasma Reactors for Plasma Processing. Specialized Techniques and Devices for Plasma Processing. Parametric Plasma Effects on Plasma Processing. Diagnostics for Plasma Processing. Plasma Treatment of Surfaces. Surface Modification by Implantation and Diffusion. Thin Film Deposition by Evaporative Condensation and Sputtering. Plasma Chemical Vapor Deposition (PCVD). Plasma Etching.
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